The programmable Genius deposition controller regulates all aspects
of the electron beam deposition process. As well as controlling
the high voltage and regulating the filament supply, the Genius
also handles the magnet current supply to the coils of the electron
All of the Genius functions are included on the
remote control which can be used to manually set and control the
evaporation process as well as to set all process and system parameters.
Access to the menu functions may be limited with
three password protected user levels.
In order to achieve the best in film quality and
uniform evaporant utilization, the genius can store a wide variety
of evaporation parameters. Different data sets can then be applied
to different phases of the process (eg. material melting and various
coating phases). In addition to storing various beam sweep parameters,
different high voltage values may also be set.
The Genius, used with a Carrera series power supplies allows up
to three electron beam sources to be run from a single power supply.
There are 2 configurations:
A Filament switch card can
be fitted to the genius to enable selection and deposition from
one of several evaporators within the vacuum chamber. For such
a configuration each evaporator will require a dedicated filament
For simultaneous evaporation
from several electron beam evaporators each source is driven
by a single Genius unit. As the emission current is directly
recorded by the filament power supply FPS-II, the evaporators
can be powered from a single Carrera high voltage power supply.
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