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January
19, 2000
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IBIS
TECHNOLOGY, SAMSUNG ELECTRONICS AND MITSUBISHI MATERIALS ENTER
INTO JOINT DEVELOPMENT AGREEMENT TO OPTIMIZE SIMOX-SOI MATERIAL
FOR USE IN HIGH PERFORMANCE CMOS SOI DEVICES...More
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November
30, 1999
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IBIS
TECHNOLOGY CORPORATION AND MITSUBISHI MATERIALS SILICON CORPORATION
COMPLETE STANDARD AND ADVANTOX® SIMOX-SOI PROCESS LICENSING
AGREEMENT.
Mitsubishi
to Provide Additional Source of Ibis Wafers to Semiconductor
Manufacturers....More
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November
7, 1999
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IBIS TECHNOLOGY ANNOUNCES PLANS TO DEVELOP NEXT-GENERATION OXYGEN
IMPLANTER...More
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September
29, 1999
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IBIS TECHNOLOGY ANNOUNCES PLANNED EXPANSION OF SIMOX WAFER PRODUCTION
CAPACITY, PERSONNEL AND FACILITIES...More
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April
6, 1999
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IBIS TECHNOLOGY CORPORATION ESTABLISHES IBIS-ON-CALL CUSTOMER
SUPPORT ORGANIZATION TO PROVIDE PARTS AND SERVICES FOR IBIS
1000 IMPLANTERS AT CUSTOMER SITES...More
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February
16, 1999
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IBIS
TECHNOLOGY DEVELOPS NEW INTEGRATED SOI SUBSTRATE FOR SYSTEM
ON A CHIP APPLICATIONS
ALTERNATING
BULK (OR EPI) AND SOI REGIONS WITH VIRTUALLY NO HEIGHT DIFFERENCE
ADVANTOX®-SI
ALLOWS SYSTEM ON A CHIP DESIGNERS TO USE EXISTING BULK LIBRARIES
AND MOVE UP TO THE SOI ADVANTAGE ...More
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January
27, 1999
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IBIS TECHNOLOGY CORPORATION COMPLETES EQUIPMENT SALE TO A LEADING
DOMESTIC SEMICONDUCTOR MANUFACTURER IN A TRANSACTION VALUED
AT APPROXIMATELY $8 MILLION ...More
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