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Plasma Systems
Contact Angle Analysis Equipment
General purpose systems
Semiconductor and wafer Systems
Flat panel display systems
Principles of Video Contact Angle Surface Analysis Presentation
business > plasma systems and contact angle analysis equipment > contact angle analysis equipment

Semiconductor/Wafer System

VCA-3000S 300mm stage

VCA-3000S Wafer Surface Analysis Systems are specially design for use in semiconductor wafer processing quality control. The system provides quick and accurate contact angle/surface energy analysis on wafer surface to evaluate adhesion, cleanliness and coatings. The syringe mechanism can be raised for easy loading and unloading eliminating the possibility of wafer damage.

Although the system was designed for wafer surface analysis it is also a useful tool for any application that requires a large stage. Samples sizes up to 12"W x 12"L x .75"H can easily be accommodated by this system.

VCA-3000S 300mm stage
VCA-3000S Wafer System
300mm stage

APPLICATIONS
  • Coating assessment of the HMDS process
  • Surface contamination detection
  • Adhesive and primer preparation
  • Coating uniformity
  • Coating quality
  • Surface cleanliness
FEATURES
  • High-resolution video camera with magnifying lens with high intensity LED lighting for precise image capture
  • 300mm rotating stage, allows access to all areas of the wafer
  • High-end PC standard with high-performance video board for advanced image analysis and video capture
  • Similar software package as our popular VCA Optima series
  • Window XP or NT Operating systems
  • 15" TFT Flat Screen Monitor
Windows™ SOFTWARE FEATURES
  • Automatic contact angle imaging and calculation
  • Dynamic droplet capture (movie viewing of droplets)
  • Surface energy (dynes/cm) analysis
  • SPC (Statistical Process Control)
  • Pendant Drop surface tension analysis

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