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Batch Plasma System - PJ, PS350 and PS500

PJ

The PJ is a table-top full featured plasma surface modification system designed for laboratory and production use. The system is ideal for surface treatment and cleaning/removing organic contamination from various substrates such as metals, ceramics, glass, and silicon. The entire bench top system fits in one cabinet (PC separate).

System Specifications
  • Main: 115 VAC, 15amp
  • RF Power: 300W, 13.56 MHz
  • RF Match: Automatch
  • Control: Windows based PC control
  • Physical Size: 24" W x 24" L x 12" H, weight 75 lbs
  • Chamber: 8" diameter, 10" depth; capacitively coupled; one gas feed
  • Gas Feed: One MFC included
  • Options: Vacuum Pump; oxygen service on pump; mist filter on pump; capacitance manometer; throttle valve; 23 cfm pump (requires 3P 208 VAC); pump filtration system, 2nd MFC
  • Chamber Options: Quartz, Pryex, Aluminum

(Click to see 3D Model)

 

PS350 and PS500

PS350 and PS500 are standard systems for high-volume batch processing

The two models are configured differently in reactor chambers and vacuum units to accommodate parts in different size and volume. PC control, advanced gas input, mixing, high-power vacuum and shelf configurations provide these systems the ability to handle various requirements in precision cleaning and surface modification.

System Configuration
REACTOR CHAMBER
  • All-aluminum construction
    • PS350 work volume: 16.75" H x 13.5" W x 20" D
    • PS500 work volume: 21" H x 14.5" W x 27" D
  • Primary plasma driven shelf design
  • Patented power distribution (US Patent no. 4,887,005 / 5,190,703 / 5,228, 963 / 5,468 560 / 5,733,511)
  • Dielectric isolation of electrodes preventing RF interaction with chamber walls
  • Front-to-back laminar distributed gas flow
  • 4 glass shelves (9 slots total)
PROCESS CONTROL SYSTEM
  • Microprocessor controller stores an infinite number of process recipes
  • Digital displays for: PROCESS TIME, PRESSURE, GAS FLOW and RF POWER
  • Automatic self-diagnostics touch screen display
  • Automatic error checking of gas flow pressure, RF, forward and reflected power
  • 2 gas lines with individual mass flow controllers and isolation valves (3rd MFC optional)
  • Fast and slow vent controls
RF GENERATOR
  • 0 - 600 watt, 13.56 MHz, solid-state generator
  • Automatic impedance matching network with fast automatic tuning
  • RF automatic impedance matching network
  • Temperature probe (option)
  • N2 backfill (option)
PUMP PACKAGES
  • Turnkey installation (including flexible plumbing and all fittings.)
  • 50 cfm 2-stage rotary vane pump (or alternative high-capacity 180 cfm roots blower package) with integral connection to process controller
  • Pump option for lubricating with inert oil
  • External filtration system with pressure gauge (option)
  • Oil-mist separator (option)
  • Integral pump starter with control panel (on blower packages)

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